The global EUV Photoresists market, valued at US$ 166.17 million in 2022, is poised for remarkable growth, with a projected market value of US$ 1,102.18 million by 2030. This growth is expected to be driven by an impressive Compound Annual Growth Rate (CAGR) of 25.37% during the forecast period spanning from 2023 to 2030.

Key Market Figures

• Initial Valuation (2022): The market was valued at US$ 166.17 million in 2022.
• Projected Value (2030): Anticipated to reach US$ 1,102.18 million by 2030.
• CAGR: Expecting a substantial CAGR of 25.37% during the forecast period (2023-2030).

Major Global Manufacturers

• Industry Leaders: Key global manufacturers of EUV Photoresists include TOK, JSR, Shin-Etsu Chemical, Fujifilm, Sumitomo, Dongjin Semichem, DuPont, Inpria, and Lam Research, among others.
• Market Concentration: In 2022, the top three vendors collectively accounted for a significant share, totaling approximately 90% of the total market revenue.

Implications and Observations

• Market Growth Potential: The forecasted CAGR signifies the high growth potential of the EUV Photoresists market, driven by technological advancements and increasing demand.

• Dominance of Top Manufacturers: The concentration of revenue among the top three vendors underscores the competitive landscape and the dominance of key players in the market.

• Technological Innovation: The involvement of major players like DuPont and Lam Research suggests a focus on innovation and technological advancements in the development of EUV Photoresists.

Market Growth Potential: The forecasted CAGR signifies the high growth potential of the EUV Photoresists market, driven by technological advancements and increasing demand.

Dominance of Top Manufacturers: The concentration of revenue among the top three vendors underscores the competitive landscape and the dominance of key players in the market.

Technological Innovation: The involvement of major players like DuPont and Lam Research suggests a focus on innovation and technological advancements in the development of EUV Photoresists.

This report aims to provide a comprehensive presentation of the global market for EUV Photoresists, with both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding EUV Photoresists.

The EUV Photoresists market size, estimations, and forecasts are provided in terms of output/shipments (Tons) and revenue ($ millions), considering 2022 as the base year, with history and forecast data for the period from 2020 to 2030. This report segments the global EUV Photoresists market comprehensively. Regional market sizes, concerning products by Type, by Application, and by players, are also provided.

For a more in-depth understanding of the market, the report provides profiles of the competitive landscape, key competitors, and their respective market ranks. The report also discusses technological trends and new product developments.

The report will help the EUV Photoresists manufacturers, new entrants, and industry chain related companies in this market with information on the revenues, production, and average price for the overall market and the sub-segments across the different segments, by company, by Type, by Application, and by regions.

By Company

• JSR
• TOK
• Shin-Etsu Chemical
• Fujifilm
• Sumitomo
• Dongjin Semichem
• DuPont
• Inpria
• Lam Research

Segment by Type

• EUV (Chemical)
• EUV (Non-Chemical)

Segment by Application

• Logic IC
• Memory
• Other

Production by Region

• Japan
• South Korea
• USA
• Other Regions

Consumption by Region

• North America
  • U.S.
  • Canada

• Asia-Pacific
  • China
  • Japan
  • Korea
  • India
  • Southeast Asia
  • Taiwan
  • Rest of Asia-Pacific

• Europe
  • Germany
  • France
  • U.K.
  • Italy
  • Rest of Europe

• Latin America
  • Mexico
  • Brazil
  • Rest of Latin America

Key Trends:

• Sensitivity and resolution improvements: As EUV technology continues advancing to enable smaller node sizes, photoresists need to be more sensitive to achieve higher resolutions and finer line widths. Resist manufacturers are working on new resist formulations with improved sensitivity.
• Line edge roughness (LER) and line width roughness (LWR) reductions: To enable tighter patterning specifications, resists are being optimized to reduce LER and LWR which can cause device defects. Better controlling these metrics helps improve chip yield.
• Low-defect resists: As EUV lithography exposes resists to high energy photons, defects can be introduced which cause chip failures. Developing resists that minimize defect formation is important for reliability.
• Resist dryness: As EUV systems require a dry lithography process run in vacuum, resists need properties like low outgassing to maintain vacuum levels. Dry resists avoid issues like pattern collapse during development.
• Multipatterning compatibility: Many chip designs now require multipatterning lithography techniques like self-aligned double patterning (SADP). Resists must be compatible with the additional processing steps involved in these methods.
• Environmental/safety improvements: Manufacturers aim to reduce the environmental and health impacts of photoresist materials by minimizing the use of volatile organic compounds and other hazardous chemicals.
• Increased EUV source power support: As EUV source wattages rise to support higher throughput production, resists need to withstand higher photon doses without degrading resolution or line edge quality.

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