Post CMP cleaning refers to the process of removing particles, residues, and contaminants from the surface of a substrate after undergoing chemical mechanical planarization (CMP). CMP is a critical step in the manufacturing of semiconductors, where it is used to create a flat and smooth surface on the substrate.

While CMP is essential for achieving the desired substrate surface, it often leaves behind residues that can negatively impact the performance and reliability of the semiconductor. Post CMP cleaning is therefore employed to effectively eliminate these residues and ensure the quality of the semiconductor.

The cleaning process typically involves using specialized cleaning solutions or chemicals, such as acidic or alkaline cleaners, to remove the residues and particles. Various techniques may be utilized, including ultrasonic cleaning, plasma cleaning, or electrochemical cleaning, depending on the specific requirements and characteristics of the semiconductor.

Post CMP cleaning plays a crucial role in enhancing the yield and functionality of semiconductors, as it ensures the cleanliness and integrity of the substrate surface. By removing any contaminants left behind by the CMP process, post CMP cleaning contributes to the overall quality and performance of the final semiconductor product.

This report aims to provide a comprehensive presentation of the global market for Post CMP Cleaning, with both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding Post CMP Cleaning.

​​​​​​​The demand for high-performance integrated circuits (ICs) is on the rise across various applications, including smartphones, tablets, laptops, and servers. These applications require ICs that offer high speed, low power consumption, and exceptional reliability. Post CMP cleaning plays a critical role in ensuring the optimal performance and reliability of these ICs.

To meet the evolving needs, there is an ongoing development of new post CMP cleaning technologies. These emerging technologies aim to enhance the effectiveness of residue and particle removal. Among the approaches being explored are ultrasonic cleaning, plasma cleaning, and electrochemical cleaning, which hold promise for improved cleaning capabilities.

In addition to technological advancements, there is a growing demand for sustainable post CMP cleaning solutions. Industry stakeholders are seeking environmentally friendly alternatives that minimize or eliminate harmful emissions. This growing focus on sustainability has spurred the development of post CMP cleaning solutions based on eco-friendly solvents and chemicals, ensuring both effective cleaning and environmental responsibility.

This report contains market size and forecasts of Post CMP Cleaning in global, including the following market information:
Global Post CMP Cleaning Market Revenue, 2018-2023, 2024-2029, ($ millions)
Global Post CMP Cleaning Market Sales, 2018-2023, 2024-2029, (Tons)
Global top five Post CMP Cleaning companies in 2022 (%)

Global key players of post CMP cleaning include Entegris, Versum Materials (Merck KGaA), Mitsubishi Chemical, Fujifilm, etc. Global top five manufacturers hold a share over 77%. North America is the largest producer of post CMP cleaning holds a share over 55%. In terms of product, acidic material is the largest segment, with a share over 53%. And in terms of application, the largest application is metal impurities and particles, with a share over 68%.

The surge in demand for semiconductors across a variety of industries like electronics, telecommunications, and automotive is the primary driving force behind the market. This increasing need for high-performance semiconductors has led to a corresponding rise in demand for post CMP cleaning solutions.

Post CMP cleaning is a crucial process used to eliminate particles, residues, and contaminants from the substrate after undergoing chemical mechanical planarization (CMP). CMP is a vital step in semiconductor manufacturing, as it helps achieve a smooth and even substrate surface. However, CMP also leaves behind residues that can negatively impact semiconductor performance. The purpose of post CMP cleaning is to eradicate these residues and ensure the overall quality of the semiconductor.

The market for post CMP cleaning is categorized based on product type, application, and geography. In terms of product type, the market consists of acidic cleaners, alkaline cleaners, and solvent-based cleaners. Acidic cleaners are the most widely employed type of post CMP cleaner due to their effectiveness in removing a broad range of residues. Alkaline cleaners are also utilized, although they may not be as effective as acidic cleaners when it comes to removing certain types of residues. Solvent-based cleaners, on the other hand, find application in specific scenarios such as cleaning hard disk drives.

We surveyed the Post CMP Cleaning manufacturers, suppliers, distributors and industry experts on this industry, involving the sales, revenue, demand, price change, product type, recent development and plan, industry trends, drivers, challenges, obstacles, and potential risks.

Total Market by Segment:
Global Post CMP Cleaning Market, by Type, 2018-2023, 2024-2029 ($ Millions) (Tons)
Global Post CMP Cleaning Market Segment Percentages, by Type, 2022 (%)

• Acidic Cleaners
• Alkaline Cleaners
• Solvent-based Cleaners

Global Post CMP Cleaning Market, by Application, 2018-2023, 2024-2029 ($ Millions) (Tons)
Global Post CMP Cleaning Market Segment Percentages, by Application, 2022 (%)

• Metal Impurities and Particles
• Organic Residue
• Electronics
• Telecommunications
• Automotive
• Others

Global Post CMP Cleaning Market, By Region and Country, 2018-2023, 2024-2029 ($ Millions) (Tons)

In 2022, North America emerged as the largest market for post CMP cleaning, capturing over 30% of the global market share. The region’s growth can be attributed to the significant presence of key semiconductor manufacturers like Intel, AMD, and Micron Technology. These industry leaders are actively investing in new product development and expanding their production capacities, thereby fueling the demand for post CMP cleaning solutions.

Europe holds the position of the second largest market, accounting for over 25% of the global market share in 2022. The growth in Europe is primarily driven by the escalating demand for semiconductors in the automotive and telecommunications sectors. The automotive industry, in particular, relies on semiconductors for diverse applications such as electronic control units (ECUs), power steering systems, and infotainment systems. Likewise, the telecommunications industry utilizes semiconductors for various purposes including base stations, routers, and switches.

As for the Asia Pacific region, it stands as the third largest market, commanding more than 20% of the global market share in 2022. The market’s expansion in this region can be attributed to the surging demand for semiconductors in the electronics and telecommunications industries. In the electronics sector, semiconductors find applications in popular devices like smartphones, tablets, and laptops. Similarly, the telecommunications industry relies on semiconductors for essential components such as base stations, routers, and switches.

The Rest of the World region secures the fourth position, accounting for over 25% of the global market share in 2022. The market’s growth in this region is fueled by the increasing demand for semiconductors in emerging markets like China, India, and Brazil. Among them, China holds the largest market share for semiconductors in the Rest of the World. The Indian market is experiencing rapid growth due to significant investments in the electronics and telecommunications sectors. Additionally, the Brazilian market is expanding as a result of increased investments in the automotive and telecommunications industries.

Global Post CMP Cleaning Market Segment Percentages, By Region and Country, 2022 (%)

North America

• U.S.
• Canada

Europe

• U.K.
• Germany
• France
• Spain
• Rest of Europe

Asia-Pacific

• India
• Japan
• China
• Australia
• South Korea
• Rest of Asia-Pacific

Latin America

• Brazil
• Mexico
• Rest of Latin America

The Middle East Africa

• South Africa
• GCC Countries
• Rest of the Middle East Africa (MEA)

Further, the report presents profiles of competitors in the market, key players include:

• Entegris
• Versum Materials (Merck KGaA)
• Mitsubishi Chemical
• Fujifilm
• DuPont
• Kanto Chemical
• BASF
• Solexir
• Anjimirco Shanghai
• Honeywell International
• Parker Hannifin
• Technic
• Solvay

Recent Developments:

• ​​​​​​​Entegris introduced its latest post CMP cleaning solution, the IONCLEAN™ ICP Platform, in January 2023. This platform employs inductively coupled plasma (ICP) technology to effectively eliminate residues and particles from wafers. Designed specifically for the manufacturing of high-performance integrated circuits (ICs), the IONCLEAN™ ICP Platform offers an advanced solution for post CMP cleaning needs.
• In February 2023, Versum Materials made an acquisition by purchasing Technic, a renowned provider of post CMP cleaning solutions. This strategic acquisition aims to expand Versum’s existing portfolio of post CMP cleaning solutions and reinforce its position in the market. By incorporating Technic’s expertise and offerings, Versum Materials can further cater to the diverse needs of customers seeking reliable post CMP cleaning solutions.
• Fujifilm introduced its eco-friendly post CMP cleaning solution, the Eco-Clean™, in March 2023. This solution is built upon environmentally friendly solvents and chemicals, aligning with the rising demand for sustainable post CMP cleaning options. With its focus on environmental responsibility, Fujifilm’s Eco-Clean™ addresses the industry’s growing need for effective yet environmentally conscious post CMP cleaning solutions.
• In April 2023, Mitsubishi Chemical Corporation launched the AquaSolv™ post CMP cleaning solution. This innovative solution utilizes a novel solvent technology that surpasses traditional solvents in effectively removing residues and particles. Mitsubishi Chemical Corporation’s AquaSolv™ caters to the industry’s demand for more efficient and reliable post CMP cleaning solutions, providing a cutting-edge option for manufacturers.